设备名称 Equipment Name

管式硼扩散炉  Horizontal Boron Diffusion Furnace

设备型号 Equipment Model

DOA-420

设备用途 Equipment Application

主要用于晶体硅太阳能电池制造中硅片的掺杂形成PN结。
The Equipment Is Mainly Used For Doping And Form Pn Junctions On Silicon Wafers In The Manufacturing Process Of Crystalline Silicon Solar Cells.

工艺流程  Process Flow

石英舟及硅片准备→插片→上料→选择工艺运行→进舟→抽真空→升温稳定→通氧→通源→推进→恒温→出舟→下舟冷却→测试→卸片
Prepare quartz boat & wafers→Insert wafers→Loading wafers→Choose recipe→Boat loading→tube Vacuuming→Temperature rising→Oxygen inlet→BBr3/BCL3 inlet→Push in→DOA treatment→Boat unloading→Cooling→Testing→Wafer unloading

技术特点  Features

1、高温硼扩散功能。
High temperature boron diffusion.

2、BBr3、BCL3。
BBr3、BCL3.

3、配套相关专利技术。
Patented technology.

4、独特双嵌套炉门结构。
Unique double-layer-nested furnace door structure.

5、专利技术尾气处理系统。
Patented technology for exhaust gas treatment system.

6、高速平稳整体模组推舟机构。
High-speed integral module boat pushing mechanism.

7、智能化全自动控制。
Intelligent automatic control.

8、自主知识产权MES软件。

MES software with independent intellectual property right.

9、全面的防超温、断偶、撞舟等安全报警保护功能。
Comprehensive safety alarm protection functions such as over-temperature prevention, broken thermocouple, and boat collision.

10、匹配S.C智能化生产管理系统。
Compatible with S.C smart factory solution.

设备参数  Parameters